The Effects of Elementary Surface Processes on the Plasma Parameters in Capacitively Coupled Radiofrequency Discharges

Aranka Derzsi, Benedek Horvath, Manaswi Daksha, Birk Berger, Sebastian Wilczek, Jan Trieschmann, Thomas Mussenbrock, Peter Awakowicz, Zoltan Donko, Julian Schulze

Workshop of the 70th Annual Gaseous Electronics Conference, Pittsburgh (Pennsylvania), USA, November 6, 2017

Tags: ccp, plasma, Simulation